Invention Grant
- Patent Title: Reticle management systems and methods
- Patent Title (中): 标线管理系统和方法
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Application No.: US11554060Application Date: 2006-10-30
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Publication No.: US07679722B2Publication Date: 2010-03-16
- Inventor: Yung-Ho Chen , Ping-Yung Yen
- Applicant: Yung-Ho Chen , Ping-Yung Yen
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Thomas, Kayden, Horstemeyer & Risley
- Main IPC: G03B27/62
- IPC: G03B27/62 ; G06F7/00 ; G06F19/00

Abstract:
Reticle management systems and methods. The system comprises at least one reticle and at least one cabinet with an inert gas environment. The cabinet comprises a plurality of storage spaces. When the reticle is put in a storage space, the cabinet identifies the reticle and the storage space occupied thereby. The cabinet provides inert gas to the reticle. The storage information of the reticle in the cabinet and/or an inert gas status of the reticle are provided to a query system and a dispatch system for reticle location query and lot dispatching.
Public/Granted literature
- US20080100814A1 RETICLE MANAGEMENT SYSTEMS AND METHODS Public/Granted day:2008-05-01
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