Invention Grant
US07679730B2 Surface inspection apparatus and surface inspection method for strained silicon wafer 有权
应变硅晶片的表面检查装置和表面检查方法

Surface inspection apparatus and surface inspection method for strained silicon wafer
Abstract:
An image pickup device disposed in a predetermined position relative to a surface of a strained silicon wafer photographs the surface of the strained silicon wafer in a plurality of rotation angle positions on photographing conditions under which bright lines appearing on the surface of the strained silicon wafer can be photographed, in an environment where a light source device illuminates the surface of the strained silicon wafer which is rotating. A composite image in a predetermined angle position is generated from surface images of the strained silicon wafer in a plurality of rotation angle positions obtained by the image pickup device.
Information query
Patent Agency Ranking
0/0