Invention Grant
- Patent Title: Method, system and apparatus of inspection
- Patent Title (中): 方法,系统和检验仪器
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Application No.: US11971384Application Date: 2008-01-09
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Publication No.: US07679737B2Publication Date: 2010-03-16
- Inventor: Naohiro Takahashi , Kiyoshi Irino
- Applicant: Naohiro Takahashi , Kiyoshi Irino
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Microelectronics Limited
- Current Assignee: Fujitsu Microelectronics Limited
- Current Assignee Address: JP Yokohama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2007-002430 20070110
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A method of inspecting defects on an object includes irradiating predetermined particles with a laser beam to measure first scattered light intensities, irradiating plural types of defects with the laser beam to measure second scattered light intensities, determining types of some defects selected out of the plural types of defects using the first scattered light intensities, setting a discrimination line indicating a boundary value of the second scattered light intensities based on the determination, and discriminating, using the discrimination line, defects on the object.
Public/Granted literature
- US20080165352A1 METHOD, SYSTEM AND APPARATUS OF INSPECTION Public/Granted day:2008-07-10
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