Invention Grant
- Patent Title: Projection objective of a microlithographic projection exposure apparatus
- Patent Title (中): 微光刻投影曝光装置的投影目标
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Application No.: US11838995Application Date: 2007-08-15
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Publication No.: US07679831B2Publication Date: 2010-03-16
- Inventor: Daniel Kraehmer , Johannes Ruoff
- Applicant: Daniel Kraehmer , Johannes Ruoff
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102006038398 20060815
- Main IPC: G02B9/00
- IPC: G02B9/00
Abstract:
Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.
Public/Granted literature
- US20080043331A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS Public/Granted day:2008-02-21
Information query
