Invention Grant
- Patent Title: Apparatus for manufacturing bonded substrate
- Patent Title (中): 用于制造键合衬底的装置
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Application No.: US11418779Application Date: 2006-05-05
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Publication No.: US07681522B2Publication Date: 2010-03-23
- Inventor: Koji Hashizume , Yoshimasa Miyajima , Norihiko Hatano , Tetsuji Kadowaki
- Applicant: Koji Hashizume , Yoshimasa Miyajima , Norihiko Hatano , Tetsuji Kadowaki
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2000-364582 20001130; JP2001-350166 20011115
- Main IPC: B05C11/10
- IPC: B05C11/10

Abstract:
The present invention provides an apparatus for manufacturing a bonded substrate that suppresses a defect in the bonded substrate. When the pressure in a vacuum chamber is at the atmospheric level, upper and lower chuck units respectively attract substrates through vacuum. When the vacuum chamber is depressurized, each chuck unit electrostatically attracts the associated substrate. During the depressurization of the vacuum chamber, the pressure for attracting each substrate to the associated chuck unit is controlled to be equal to the pressure in the vacuum chamber. This prevents each substrate from falling from or moving relative to the associated chuck unit. The first and second substrates are thus bonded together and accurately aligned.
Public/Granted literature
- US20060201424A1 Apparatus for manufacturing bonded substrate Public/Granted day:2006-09-14
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