Invention Grant
- Patent Title: Method of machining substrate
- Patent Title (中): 基板加工方法
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Application No.: US12133143Application Date: 2008-06-04
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Publication No.: US07682224B2Publication Date: 2010-03-23
- Inventor: Yusuke Kimura , Toshiharu Daii , Takashi Mori
- Applicant: Yusuke Kimura , Toshiharu Daii , Takashi Mori
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2007-160983 20070619
- Main IPC: B24B1/00
- IPC: B24B1/00

Abstract:
A method of machining a wafer is disclosed, in which the wafer is held by sucking its back-side surface directly onto a suction surface of a chuck table, and the tips of protruding electrodes and a resist layer are cut to make them flush with each other (appendant part cutting step). Next, the wafer is held by sucking the surface of the cut appendant part directly onto the suction surface of the chuck table, and the back-side surface of the wafer is ground (back-side surface grinding step), followed by removing the resist layer. The wafer is held onto the chuck table without using any protective tape but by directly holding the wafer, whereby the wafer can be ground to have a uniform thickness.
Public/Granted literature
- US20080318497A1 METHOD OF MACHINING SUBSTRATE Public/Granted day:2008-12-25
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