Invention Grant
- Patent Title: High-frequency treatment apparatus
- Patent Title (中): 高频治疗仪
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Application No.: US11601859Application Date: 2006-11-17
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Publication No.: US07682359B2Publication Date: 2010-03-23
- Inventor: Tsuyoshi Hayashida , Kazunori Taniguchi , Shigeo Nagayama , Kazuya Hijii
- Applicant: Tsuyoshi Hayashida , Kazunori Taniguchi , Shigeo Nagayama , Kazuya Hijii
- Applicant Address: JP Tokyo
- Assignee: Olympus Corporation
- Current Assignee: Olympus Corporation
- Current Assignee Address: JP Tokyo
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Priority: JP2004-292956 20041005; JP2004-353425 20041206
- Main IPC: A61B18/12
- IPC: A61B18/12

Abstract:
The present invention provides a high-frequency treatment apparatus including: an electrode assembly electrically connected to a high-frequency generating unit for generating a high-frequency current, the assembly having, at the distal end thereof, a current-applying electrode for discharging the high-frequency current, the proximal end of the current-applying electrode being covered with an insulator; an insertion section receiving the electrode assembly, the insertion section being located on the return side of the high-frequency current discharged from the current-applying electrode; a liquid supply section for supplying an irrigation liquid to the vicinity of the current-applying electrode; and an opening section provided at the distal end part of the insulator, the opening section supplying a gas to the vicinity of the current-applying electrode.
Public/Granted literature
- US20070093812A1 High-frequency treatment apparatus Public/Granted day:2007-04-26
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