Invention Grant
US07682454B2 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
有权
具有受保护的密封件和相关的小型加工腔室和多腔室系统的周边分隔阀
- Patent Title: Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
- Patent Title (中): 具有受保护的密封件和相关的小型加工腔室和多腔室系统的周边分隔阀
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Application No.: US10567319Application Date: 2004-08-09
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Publication No.: US07682454B2Publication Date: 2010-03-23
- Inventor: Ofer Sneh
- Applicant: Ofer Sneh
- Applicant Address: US CO Broomfield
- Assignee: Sundew Technologies, LLC
- Current Assignee: Sundew Technologies, LLC
- Current Assignee Address: US CO Broomfield
- Agency: Patton Boggs LLP
- International Application: PCT/US2004/025612 WO 20040809
- International Announcement: WO2005/015613 WO 20050217
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; C23C16/06 ; C23C16/22

Abstract:
A seal-protected perimeter partition valve apparatus (450) defines a vacuum and pressure sealed space (401) within a larger space (540) confining a substrate processing chamber with optimized geometry, minimized footprint and 360° substrate accessibility. A compact perimeter partitioned assembly (520) with seal protected perimeter partition valve (450) and internally contained substrate placement member (480) further provides processing system modularity and substantially minimized system footprint.
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