Invention Grant
- Patent Title: Aqueous based residue removers comprising fluoride
- Patent Title (中): 含氟的残留物去除剂
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Application No.: US11050562Application Date: 2005-02-03
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Publication No.: US07682458B2Publication Date: 2010-03-23
- Inventor: Roberto John Rovito , Aiping Wu
- Applicant: Roberto John Rovito , Aiping Wu
- Applicant Address: US PA Allentown
- Assignee: Air Products and Chemicals, Inc.
- Current Assignee: Air Products and Chemicals, Inc.
- Current Assignee Address: US PA Allentown
- Agent Rosaleen P. Morris-Oskanian
- Main IPC: C11D7/32
- IPC: C11D7/32
Abstract:
A composition and method comprising same for selectively removing residues such as, for example, ashed photoresist and/or processing residues are disclosed herein. In one aspect, there is provided a composition for removing residue wherein the composition has a pH ranging from about 2 to about 9 comprising: a buffer solution comprising an organic acid and a conjugate base of the organic acid in a molar ratio of acid to base ranging from 10:1 to 1:10; a fluoride, and water, provided that the composition is substantially free of an added organic solvent. In another aspect, the composition may further comprise a corrosion inhibitor.
Public/Granted literature
- US20060172905A1 Aqueous based residue removers comprising fluoride Public/Granted day:2006-08-03
Information query
