Invention Grant
- Patent Title: Plasma generation apparatus and work processing apparatus
- Patent Title (中): 等离子体发生装置和作业处理装置
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Application No.: US11703038Application Date: 2007-02-06
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Publication No.: US07682482B2Publication Date: 2010-03-23
- Inventor: Kazuhiro Yoshida , Ryuichi Iwasaki , Hirofumi Mankawa
- Applicant: Kazuhiro Yoshida , Ryuichi Iwasaki , Hirofumi Mankawa
- Applicant Address: JP Wakayama
- Assignee: Noritsu Koki Co., Ltd.
- Current Assignee: Noritsu Koki Co., Ltd.
- Current Assignee Address: JP Wakayama
- Agency: Jordan and Hamburg LLP
- Priority: JP2006-042197 20060220
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306
Abstract:
A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.
Public/Granted literature
- US20070193516A1 Plasma generation apparatus and work processing apparatus Public/Granted day:2007-08-23
Information query
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