Invention Grant
- Patent Title: Electrode cartridge and a system for measuring an internal stress for a film of plating
- Patent Title (中): 电极盒和用于测量电镀膜的内部应力的系统
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Application No.: US11049304Application Date: 2005-02-03
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Publication No.: US07682493B2Publication Date: 2010-03-23
- Inventor: Wataru Yamamoto , Katsunori Akiyama , Fumio Harada , Yutaka Tsuru
- Applicant: Wataru Yamamoto , Katsunori Akiyama , Fumio Harada , Yutaka Tsuru
- Applicant Address: JP Tokyo
- Assignee: Yamamoto-MS Co., Ltd.
- Current Assignee: Yamamoto-MS Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Berenato & White, LLC
- Priority: JP2004-027300 20040203
- Main IPC: B23H3/04
- IPC: B23H3/04

Abstract:
The electrode cartridge for measuring an internal stress of a film of plating includes a cathode support, an anode support, a shield plate and an anode shell. The anode support supports an anode plate so that the anode plate is opposite to the cathode plate with a predetermined spacing. The shield plate is interposed between the cathode and anode plates. A through hole is made in the shield plate in such a manner that the through hole confronts a plating section and has a geometry which is reduced by a first predetermined scale factor relative to a geometry of the plating section. An opening is made in the anode shell in such a manner that the opening confronts the plating section and has a geometry which is magnified by a second predetermined scale factor relative to the geometry of the plating section.
Public/Granted literature
- US20050189220A1 Electrode cartridge and a system for measuring an internal stress for a film of plating Public/Granted day:2005-09-01
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