Invention Grant
- Patent Title: Negative C-type compensation film and method of preparing the same
- Patent Title (中): 负C型补偿膜及其制备方法
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Application No.: US11519009Application Date: 2006-09-12
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Publication No.: US07682672B2Publication Date: 2010-03-23
- Inventor: Hyo Sun Lee , Dong Ryul Kim , Hee Jung Kim , Dae Woo Nam , Sang Uk Ryu , Boong Goon Jeong , Ju Eun Cha , Ho Jun Lee
- Applicant: Hyo Sun Lee , Dong Ryul Kim , Hee Jung Kim , Dae Woo Nam , Sang Uk Ryu , Boong Goon Jeong , Ju Eun Cha , Ho Jun Lee
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2005-0085219 20050913
- Main IPC: G02F1/13363
- IPC: G02F1/13363

Abstract:
Disclosed are a negative C-type compensation film and a method of preparing the same. The negative C-type compensation film includes a) a base layer, and b) a polymer layer comprising polyarylate prepared by a method comprising the step of copolymerizing divalent phenols, divalent aromatic carboxylic acid halides, and allyl bisphenol derivatives, the base layer and the polymer layer being sequentially layered. The compensation film is capable of being used for the negative C-type compensation film without a stretching process, significantly reduces the thickness of the compensation film, and has significantly improved interlayer adhesion force in a multilayer structure.
Public/Granted literature
- US20070059456A1 Negative C-type compensation film and method of preparing the same Public/Granted day:2007-03-15
Information query
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