Invention Grant
- Patent Title: Light emitting diode and fabrication method thereof
- Patent Title (中): 发光二极管及其制造方法
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Application No.: US11889549Application Date: 2007-08-14
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Publication No.: US07682849B2Publication Date: 2010-03-23
- Inventor: Seong Jae Kim
- Applicant: Seong Jae Kim
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd.
- Current Assignee: LG Innotek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A light emitting diode (LED) and a method for fabricating the same, capable of improving brightness by forming a InGaN layer having a low concentration of indium, and whose lattice constant is similar to that of an active layer of the LED, is provided. The LED includes: a buffer layer disposed on a sapphire substrate; a GaN layer disposed on the buffer layer; a doped GaN layer disposed on the GaN layer; a GaN layer having indium disposed on the GaN layer; an active layer disposed on the GaN layer having indium; and a P-type GaN disposed on the active layer. Here, an empirical formula of the GaN layer having indium is given by In(x)Ga(1-x)N and a range of x is given by 0
Public/Granted literature
- US20070281378A1 Light emitting diode and fabrication method thereof Public/Granted day:2007-12-06
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