Invention Grant
- Patent Title: Electro-optical device, method of manufacturing electro-optical device, and electronic apparatus
- Patent Title (中): 电光装置,电光装置的制造方法以及电子装置
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Application No.: US11522792Application Date: 2006-09-18
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Publication No.: US07682856B2Publication Date: 2010-03-23
- Inventor: Tatsuya Ishii
- Applicant: Tatsuya Ishii
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: AdvantEdge Law Group, LLC
- Priority: JP2005-337003 20051122
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An electro-optical device includes, above a substrate, a plurality of data lines and a plurality of scanning lines that cross each other, a plurality of pixel electrodes that are provided so as to correspond to intersections between the plurality of data lines and the plurality of scanning lines, and transistors, each of which is electrically connected to the pixel electrode and has an LDD structure. Further, each of the transistors has a semiconductor layer in which an impurity region is formed around a channel region, the impurity region having a heavily doped region and a lightly doped region whose impurity concentrations are different from each other, a first gate electrode that is formed on the channel region so as not to overlap the lightly doped region in plan view, and a second gate electrode that is electrically connected to the first gate electrode and that is formed on the first gate electrode so as to cover the lightly doped region in plan view.
Public/Granted literature
- US20070117239A1 Electro-optical device, method of manufacturing electro-optical device, and electronic apparatus Public/Granted day:2007-05-24
Information query
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