Invention Grant
- Patent Title: Method for fabricating pixel structure
- Patent Title (中): 制造像素结构的方法
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Application No.: US12017342Application Date: 2008-01-22
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Publication No.: US07682884B2Publication Date: 2010-03-23
- Inventor: Han-Tu Lin , Chih-Chun Yang , Ming-Yuan Huang , Chih-Hung Shih , Ta-Wen Liao , Chia-Chi Tsai
- Applicant: Han-Tu Lin , Chih-Chun Yang , Ming-Yuan Huang , Chih-Hung Shih , Ta-Wen Liao , Chia-Chi Tsai
- Applicant Address: TW Hsinchu
- Assignee: Au Optronics Corporation
- Current Assignee: Au Optronics Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW96136778A 20071001
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for fabricating a pixel structure using a laser ablation process is provided. This fabrication method forms a gate, a channel layer, a source, a drain, a passivation layer, and a pixel electrode sequentially by using a laser ablation process. Particularly, the fabrication method is not similar to a photolithography and etching process, so as to reduce the complicated photolithography and etching processes, such as spin coating process, soft-bake, hard-bake, exposure, developing, etching, and stripping. Therefore, the fabrication method simplifies the process and thus reduces the fabrication cost.
Public/Granted literature
- US20090087954A1 METHOD FOR FABRICATING PIXEL STRUCTURE Public/Granted day:2009-04-02
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