Invention Grant
- Patent Title: Using an interferometer as a high speed variable attenuator
- Patent Title (中): 使用干涉仪作为高速可变衰减器
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Application No.: US11581786Application Date: 2006-10-17
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Publication No.: US07683300B2Publication Date: 2010-03-23
- Inventor: Oscar Franciscus Jozephus Noordman , Justin L. Kreuzer
- Applicant: Oscar Franciscus Jozephus Noordman , Justin L. Kreuzer
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01J1/32
- IPC: G01J1/32 ; G02B26/00 ; G02F1/33 ; G03B27/74
Abstract:
A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
Public/Granted literature
- US20080117494A1 Using an interferometer as a high speed variable attenuator Public/Granted day:2008-05-22
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