Invention Grant
US07683313B2 Charged particle beam measurement equipment, size correction and standard sample for correction
有权
带电粒子束测量设备,尺寸校正和标准样品进行校正
- Patent Title: Charged particle beam measurement equipment, size correction and standard sample for correction
- Patent Title (中): 带电粒子束测量设备,尺寸校正和标准样品进行校正
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Application No.: US12010852Application Date: 2008-01-30
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Publication No.: US07683313B2Publication Date: 2010-03-23
- Inventor: Yasunari Sohda , Yoshinori Nakayama , Hajime Koyanagi , Keiichiro Hitomi
- Applicant: Yasunari Sohda , Yoshinori Nakayama , Hajime Koyanagi , Keiichiro Hitomi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Stities & Harbison PLLC
- Agent Juan Carlos A. Marquez, Esq.
- Priority: JP2007-049357 20070228
- Main IPC: G01D18/00
- IPC: G01D18/00

Abstract:
Correction of widths obtained by measurement of a sample with the use of a scanning electron microscope is executed with greater precision. A standard sample for correction comprises a plurality of correction mark members, the respective correction mark members, being lined up at specified intervals in a specified direction, and respective widths thereof, in the specified direction, differing from each other so as to be of respective sizes as pre-set. Measurement of the respective widths of the correction mark members is made to obtain respective measurement widths while authorized widths of the correction mark members are kept stored in an image processing unit of the scanning electron microscope to thereby find differences between the respective measurement widths, and authorized widths corresponding thereto, and the differences are stored as respective correction functions to correct the measurement width of the sample.
Public/Granted literature
- US20080203285A1 Charged particle beam measurement equipment, size correction and standard sample for correction Public/Granted day:2008-08-28
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