An electron beam writing data creating method for creating writing data used for electron beam lithography includes judging whether a resizing process needs to be performed to a figure cell in device pattern data by cell based design or not, the figure cell including a cell layout frame and a pattern in the cell layout frame; performing the resizing process to the figure cell based on a relationship between the cell layout frame and the pattern, and resizing quantity of the resize process in a case where the resizing process is judged as needed to be performed; creating a character pattern cutting frame from the cell layout frame; and extracting a figure in the character pattern cutting frame as a character pattern.