Invention Grant
- Patent Title: Extreme ultra violet light source apparatus
- Patent Title (中): 极紫外光源装置
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Application No.: US11902596Application Date: 2007-09-24
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Publication No.: US07683355B2Publication Date: 2010-03-23
- Inventor: Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
- Applicant: Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
- Applicant Address: JP Tokyo
- Assignee: Komatsu Ltd.
- Current Assignee: Komatsu Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2006-263371 20060927
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G21G4/00 ; A61N5/06 ; G01J3/10

Abstract:
An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.
Public/Granted literature
- US20080073598A1 Extreme ultra violet light source apparatus Public/Granted day:2008-03-27
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