Invention Grant
- Patent Title: Transistor
- Patent Title (中): 晶体管
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Application No.: US11758304Application Date: 2007-06-05
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Publication No.: US07683399B2Publication Date: 2010-03-23
- Inventor: Hidetoshi Ishida , Tsuyoshi Tanaka , Daisuke Ueda
- Applicant: Hidetoshi Ishida , Tsuyoshi Tanaka , Daisuke Ueda
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein P.L.C.
- Priority: JP2006-157776 20060606
- Main IPC: H01L31/0328
- IPC: H01L31/0328

Abstract:
There is provided a normally-off type transistor made of a nitride semiconductor. The transistor includes; an undoped GaN layer which forms a channel region; an undoped Al0.2Ga0.8N layer which is formed on the undoped GaN layer and has a band gap larger than that of the undoped GaN layer; a p-type Al0.2Ga0.8N control layer which is formed on the undoped Al0.2Ga0.8N layer, has a p-type conductivity and forms a control region; an Ni gate electrode which contacts with the p-type Al0.2Ga0.8N control layer; a Ti/Al source electrode and a Ti/Al drain electrode which are formed beside the p-type Al0.2Ga0.8N control layer; and an Ni ohmic electrode which is connected to the undoped GaN layer and serves as a hole absorbing electrode. With this transistor, it is possible to achieve a large-current operation and a high switching speed.
Public/Granted literature
- US20070278521A1 TRANSISTOR Public/Granted day:2007-12-06
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