Invention Grant
- Patent Title: Processing method and processing device of conditioning electron gun
- Patent Title (中): 调节电子枪的处理方法和处理装置
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Application No.: US11860178Application Date: 2007-09-24
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Publication No.: US07683551B2Publication Date: 2010-03-23
- Inventor: Nobuo Miyamoto
- Applicant: Nobuo Miyamoto
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-259373 20060925
- Main IPC: H01J9/50
- IPC: H01J9/50

Abstract:
Discharge factors existing on a surface of an electrode or an insulator forming an electron gun are removed efficiently and effectively, thus simply and easily enhancing the withstand voltage property of the electron gun. A conditioning processing device of an electron gun is provided with a voltage supply section, a voltage adjusting section for adjusting the output voltage of the voltage supply section, and a current detection section for detecting a leakage current flowing between the electrodes of the electron gun. Further, there are attached a vacuum exhaust section for adjusting the inside of the electron gun in a reduced pressure condition and a pressure detection section. Further, it is arranged that a personal computer (PC), for example, performs data processing based on the leakage current detected by the current detection section or comparison with a reference value thereof to control the voltage, which is applied between the electrodes from the voltage supply section via a connection section, via the voltage adjustment section.
Public/Granted literature
- US20080153376A1 PROCESSING METHOD AND PROCESSING DEVICE OF CONDITIONING ELECTRON GUN Public/Granted day:2008-06-26
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