Invention Grant
US07684010B2 Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
有权
平版印刷装置，装置制造方法，密封结构，移除物体的方法和密封方法
- Patent Title: Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
- Patent Title (中): 平版印刷装置，装置制造方法，密封结构，移除物体的方法和密封方法
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Application No.: US11075819Application Date: 2005-03-09
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Publication No.: US07684010B2Publication Date: 2010-03-23
- Inventor: Patrick Johannes Cornelus Hendrick Smulders , Peter Smits
- Applicant: Patrick Johannes Cornelus Hendrick Smulders , Peter Smits
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed and in an embodiment, reduces transmission of forces between the different parts.
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