Invention Grant
US07684012B2 Lithographic device, device manufacturing method and device manufactured thereby
有权
平版印刷装置，装置制造方法和由此制造的装置
- Patent Title: Lithographic device, device manufacturing method and device manufactured thereby
- Patent Title (中): 平版印刷装置，装置制造方法和由此制造的装置
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Application No.: US11391731Application Date: 2006-03-29
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Publication No.: US07684012B2Publication Date: 2010-03-23
- Inventor: Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
- Applicant: Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
Public/Granted literature
- US20060268246A1 Lithographic device, device manufacturing method and device manufactured thereby Public/Granted day:2006-11-30
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