Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11436058Application Date: 2006-05-18
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Publication No.: US07684013B2Publication Date: 2010-03-23
- Inventor: Steven George Hansen , Donis George Flagello , Wolfgang Singer , Bernd Peter Geh , Vladan Blahnik
- Applicant: Steven George Hansen , Donis George Flagello , Wolfgang Singer , Bernd Peter Geh , Vladan Blahnik
- Applicant Address: NL Veldhoven DE Oberkochen
- Assignee: ASML Netherlands B.V.,Carl Zeiss SMT AG
- Current Assignee: ASML Netherlands B.V.,Carl Zeiss SMT AG
- Current Assignee Address: NL Veldhoven DE Oberkochen
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: DE102005023714 20050519
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/72
Abstract:
A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
Public/Granted literature
- US20070002300A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-01-04
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