Invention Grant
- Patent Title: Bragg mirror optimized for shear waves
- Patent Title (中): 针对剪切波优化的布拉格镜
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Application No.: US11713461Application Date: 2007-02-28
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Publication No.: US07684109B2Publication Date: 2010-03-23
- Inventor: Ed Godshalk , Guillaume Bouche
- Applicant: Ed Godshalk , Guillaume Bouche
- Applicant Address: US CA Sunnyvale
- Assignee: Maxim Integrated Products, Inc.
- Current Assignee: Maxim Integrated Products, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: TIPS Group
- Main IPC: G02F1/33
- IPC: G02F1/33 ; G02F1/03

Abstract:
In an embodiment, set forth by way of example and not limitation, a Bragg mirror includes a first bi-layer of a first thickness and a second bi-layer of a second thickness which is different from the first thickness. In this exemplary embodiment, the first bi-layer consists essentially of a first high impedance layer and a first low impedance layer, and the second bi-layer of a second thickness which is different from the first thickness, the second bi-layer consisting essentially of a second high impedance layer and a second low impedance layer. Preferably, the first bi-layer is configured to substantially reflect a first wavelength and the second bi-layer is configured to substantially reflect a second wavelength different from the first wavelength.
Public/Granted literature
- US20080204857A1 Bragg mirror optimized for shear waves Public/Granted day:2008-08-28
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