Invention Grant
- Patent Title: Diaphragm changing device
- Patent Title (中): 隔膜更换装置
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Application No.: US10595583Application Date: 2003-12-18
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Publication No.: US07684125B2Publication Date: 2010-03-23
- Inventor: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
- Applicant: Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
- Applicant Address: DE
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE
- Agency: GrayRobinson, P.A.
- Priority: DE10350545 20031029
- International Application: PCT/EP03/14551 WO 20031218
- International Announcement: WO2005/050322 WO 20050602
- Main IPC: G02B9/00
- IPC: G02B9/00
Abstract:
The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
Public/Granted literature
- US20070053076A1 Diaphragm changing device Public/Granted day:2007-03-08
Information query
