Invention Grant
- Patent Title: Surface-emission laser diode and fabrication process thereof
- Patent Title (中): 表面发射激光二极管及其制造工艺
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Application No.: US10567809Application Date: 2005-06-08
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Publication No.: US07684458B2Publication Date: 2010-03-23
- Inventor: Shunichi Sato , Akihiro Itoh , Naoto Jikutani
- Applicant: Shunichi Sato , Akihiro Itoh , Naoto Jikutani
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Durham, LLP
- Priority: JP2004-173890 20040611; JP2004-359671 20041213; JP2005-088188 20050325; JP2005-101765 20050331
- International Application: PCT/JP2005/010520 WO 20050608
- International Announcement: WO2005/122350 WO 20051222
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A surface-emission laser diode comprises a cavity region over a semiconductor substrate and includes an active layer containing at least one quantum well active layer producing a laser light and a barrier layer, a spacer layer is provided in the vicinity of the active layer and formed of at least one material, an upper and lower reflectors are provided at a top part and a bottom part of the cavity region, the cavity region and the upper and lower reflectors form a mesa structure over the semiconductor substrate, the upper and lower reflectors being formed of a semiconductor distributed Bragg reflector having a periodic change of refractive index and reflecting incident light by interference of optical waves, at least a part of the semiconductor distributed Bragg reflector is formed of a layer of small refractive index of AlxGa1-xAs (0
Public/Granted literature
- US20080212636A1 Surface-Emission Laser Diode and Fabrication Process Thereof Public/Granted day:2008-09-04
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