Invention Grant
- Patent Title: Method for detection and scoring of hot spots in a design layout
- Patent Title (中): 设计布局中热点的检测和评分方法
-
Application No.: US11682640Application Date: 2007-03-06
-
Publication No.: US07685558B2Publication Date: 2010-03-23
- Inventor: Chih-Ming Lai , Ru-Gun Liu , I-Chang Shin , Yao-Ching Ku , Cliff Hou
- Applicant: Chih-Ming Lai , Ru-Gun Liu , I-Chang Shin , Yao-Ching Ku , Cliff Hou
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for detection and scoring of hotspots in a design layout is provided. A plurality of indices is derived for a plurality of positions in the design layout. The plurality of indices comprises a first index sensitive to energy exposure of the design layout, a second index sensitive to process image formation, and a third index sensitive to mask manufacturing error. The plurality of indices is then analyzed to identify at least one hotspot in the design layout. The at least one hotspot is then prioritized using an integrated hotspot scoring system. The integrated hotspot scoring system prioritizes hotspots based on a look-up table approach or an interpolation approach.
Public/Granted literature
- US20070266362A1 Method for Detection and Scoring of Hot Spots in a Design Layout Public/Granted day:2007-11-15
Information query