Invention Grant
- Patent Title: Fluid injection head, method of manufacturing the injection head, and fluid injection device
- Patent Title (中): 流体注射头，注射头的制造方法和流体注射装置
-
Application No.: US10520662Application Date: 2003-07-10
-
Publication No.: US07686421B2Publication Date: 2010-03-30
- Inventor: Takeshi Yasoshima , Masato Shimada , Akira Matsuzawa
- Applicant: Takeshi Yasoshima , Masato Shimada , Akira Matsuzawa
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2002-201296 20020710; JP2002-226172 20020802; JP2002-227840 20020805; JP2003-001077 20030107; JP2003-193909 20030708
- International Application: PCT/JP03/08773 WO 20030710
- International Announcement: WO2004/007206 WO 20040122
- Main IPC: B41J2/135
- IPC: B41J2/135 ; B41J2/045 ; G01D15/00 ; G11B5/127
Abstract:
Provided is a liquid jet head, a method of manufacturing the same, and a liquid jet apparatus, in which liquid ejecting characteristics can be kept constant for a long period and in which nozzle blockage is prevented. In a liquid jet head including a passage-forming substrate (10) which is made of a single crystal silicon substrate and in which pressure generating chambers (12) communicating with nozzle orifices are formed, and pressure generating elements (300) for causing pressure changes in the pressure generating chambers (12), a protective film (100) which is made of tantalum oxide and has resistance to liquid, is provided at least on the inner wall surfaces of the pressure generating chambers (12).
Public/Granted literature
- US20060152548A1 Fluid injection head, method of manufacturing the injection head, and fluid injection device Public/Granted day:2006-07-13
Information query
IPC分类:
