Invention Grant
- Patent Title: Mold for nano imprinting
- Patent Title (中): 使用该模具制造模具和存储介质的模具制造方法
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Application No.: US10518475Application Date: 2003-06-16
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Publication No.: US07687007B2Publication Date: 2010-03-30
- Inventor: Torbjörn Ling , Lars Montelius , Matthias Keil , Marc Beck
- Applicant: Torbjörn Ling , Lars Montelius , Matthias Keil , Marc Beck
- Applicant Address: SE Malmo
- Assignee: Obducat AB
- Current Assignee: Obducat AB
- Current Assignee Address: SE Malmo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- International Application: PCT/SE03/01004 WO 20030616
- International Announcement: WO04/000567 WO 20031231
- Main IPC: B29C33/56
- IPC: B29C33/56

Abstract:
Method for manufacturing a mold tool (1), devised for forming a structured nanoscale pattern on an object (24) and having a layer (16) which is anti-adhesive with regard to the object (24). A stamp blank (2) is provided with a structured pattern (4) on a surface (8). The patterned surface (8) is coated with a layer (6) of a metal, which has a stable oxidation number and can form a mechanically stable oxide film. The metal layer (6) is oxidized for forming of an oxide film (10). The oxide film (10) is exposed to a reagent comprising molecule chains (18), each of which has a linkage group (20) which bonds to the oxide film (10) by chemical bonding, wherein the molecule chains (18) either at the outset comprise at least a group (22) comprising fluorine, or in a subsequent step is provided with at least one such group (22).
Public/Granted literature
- US20050287820A1 Mold for nano imprinting Public/Granted day:2005-12-29
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