Invention Grant
- Patent Title: Oxime derivatives and use thereof as latent acids
- Patent Title (中): 肟衍生物及其用作潜伏酸
-
Application No.: US11632687Application Date: 2005-07-11
-
Publication No.: US07687220B2Publication Date: 2010-03-30
- Inventor: Hitoshi Yamato , Toshikage Asakura , Tobias Hintermann
- Applicant: Hitoshi Yamato , Toshikage Asakura , Tobias Hintermann
- Applicant Address: US NY Tarrytown
- Assignee: Ciba Specialty Chemicals Corporation
- Current Assignee: Ciba Specialty Chemicals Corporation
- Current Assignee Address: US NY Tarrytown
- Agent Joseph C. Suhadolnik
- Priority: EP04103453 20040720
- International Application: PCT/EP2005/053296 WO 20050711
- International Announcement: WO2006/008250 WO 20060126
- Main IPC: G03F7/028
- IPC: G03F7/028 ; C07C259/08

Abstract:
The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.
Public/Granted literature
- US20080085458A1 Oxime Derivatives And Use Thereof As Latent Acids Public/Granted day:2008-04-10
Information query
IPC分类: