Invention Grant
- Patent Title: Image sensor and method for manufacturing the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US12046035Application Date: 2008-03-11
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Publication No.: US07687305B2Publication Date: 2010-03-30
- Inventor: Sang-Wook Ryu
- Applicant: Sang-Wook Ryu
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd
- Current Assignee: Dongbu HiTek Co., Ltd
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2007-0024920 20070314
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/78

Abstract:
An image sensor include an interlayer dielectric layer formed over a semiconductor substrate; a color filter array formed over the interlayer dielectric layer; a planarization layer formed over the color filter; and a microlens array having a continuous, gapless shape formed over the planarization layer and spatially corresponding to the color filter array. The microlens array is composed of a first dielectric layer and a second dielectric layer formed over the first dielectric layer.
Public/Granted literature
- US20080224244A1 IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2008-09-18
Information query
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