Invention Grant
- Patent Title: Method for adhering semiconductor devices
- Patent Title (中): 用于粘附半导体器件的方法
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Application No.: US12122083Application Date: 2008-05-16
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Publication No.: US07687316B2Publication Date: 2010-03-30
- Inventor: Oh Jin Jung
- Applicant: Oh Jin Jung
- Applicant Address: KR Seoul
- Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: KR10-2007-0048575 20070518
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A method for adhering semiconductor devices is provided. The method includes forming a first semiconductor device including a first metal pad, forming a second semiconductor device including a second metal pad, adhering the first semiconductor device to the second semiconductor device, the first metal pad electrically connecting the second metal pad, and forming a heat sink via in the second semiconductor device.
Public/Granted literature
- US20080286900A1 METHOD FOR ADHERING SEMICONDUCTOR DEVICES Public/Granted day:2008-11-20
Information query
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