Invention Grant
- Patent Title: Method of manufacturing a memory device
- Patent Title (中): 制造存储器件的方法
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Application No.: US11219349Application Date: 2005-09-01
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Publication No.: US07687342B2Publication Date: 2010-03-30
- Inventor: Gordon A. Haller , David K. Hwang , Sanh Dang Tang , Ceredig Roberts
- Applicant: Gordon A. Haller , David K. Hwang , Sanh Dang Tang , Ceredig Roberts
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L21/8242
- IPC: H01L21/8242

Abstract:
A memory device comprises an active area comprising a source and at least two drains defining a first axis. At least two substantially parallel word lines are defined by a first pitch, with one word line located between each drain and the source. Digit lines are defined by a second pitch, one of the digit lines being coupled to the source and forming a second axis. The active areas of the memory array are tilted at 45° to the grid defined by the word lines and digit lines. The word line pitch is about 1.5F, while the digit line pitch is about 3F.
Public/Granted literature
- US20070045712A1 Memory cell layout and process flow Public/Granted day:2007-03-01
Information query
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