Invention Grant
- Patent Title: Field-effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US11709690Application Date: 2007-02-23
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Publication No.: US07687828B2Publication Date: 2010-03-30
- Inventor: Hisayoshi Matsuo , Tetsuzo Ueda
- Applicant: Hisayoshi Matsuo , Tetsuzo Ueda
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-113786 20060417; JP2006-179088 20060629
- Main IPC: H01L31/072
- IPC: H01L31/072

Abstract:
A field-effect transistor has a so-called double heterostructure which is formed such that a channel layer through which electrons travel is provided between an electron supply layer and a liner layer, wherein a forbidden band width of the liner layer and a forbidden band width of the electron supply layer are broader than a forbidden bandwidth of the channel layer.
Public/Granted literature
- US20070272945A1 Field-effect transistor Public/Granted day:2007-11-29
Information query
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