Invention Grant
- Patent Title: Contact load measuring apparatus and inspecting apparatus
- Patent Title (中): 接触式负载测量装置和检查装置
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Application No.: US11659085Application Date: 2005-07-28
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Publication No.: US07688096B2Publication Date: 2010-03-30
- Inventor: Isamu Inomata
- Applicant: Isamu Inomata
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-226149 20040802
- International Application: PCT/JP2005/013826 WO 20050728
- International Announcement: WO2006/013773 WO 20060209
- Main IPC: G01R31/02
- IPC: G01R31/02

Abstract:
An inspecting apparatus is provided for inspecting electrical characteristics of an object (W) to be inspected, such as a semiconductor wafer. The inspecting apparatus is provided with a placing table (11) for supporting the object, a lift mechanism (12) for bringing up and down the placing table, and a driving apparatus (24) for driving the lift mechanism. The apparatus is also provided with a probe (13A) which makes contact with the object on the placing table brought up by the lift mechanism driven by the driving apparatus, and a load sensor (21), including a compression-type piezoelectric element, for detecting a contact load between the object and the probe as an oscillation waveform.
Public/Granted literature
- US20090039903A1 Contact load measuring apparatus and inspecting apparatus Public/Granted day:2009-02-12
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