Invention Grant
- Patent Title: Projection optical system, exposure system, and exposure method
- Patent Title (中): 投影光学系统,曝光系统和曝光方法
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Application No.: US11665490Application Date: 2005-10-12
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Publication No.: US07688422B2Publication Date: 2010-03-30
- Inventor: Hironori Ikezawa , Yasuhiro Omura
- Applicant: Hironori Ikezawa , Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-303191 20041018
- International Application: PCT/JP2005/018807 WO 20051012
- International Announcement: WO2006/043457 WO 20060427
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58 ; G03B27/54

Abstract:
An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1
Public/Granted literature
- US20070285633A1 Projection Optical System, Exposure System, And Exposure Method Public/Granted day:2007-12-13
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