Invention Grant
- Patent Title: Measurement apparatus, exposure apparatus, and device fabrication method
- Patent Title (中): 测量装置,曝光装置和装置制造方法
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Application No.: US12205288Application Date: 2008-09-05
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Publication No.: US07688424B2Publication Date: 2010-03-30
- Inventor: Yumiko Ohsaki , Seiji Takeuchi
- Applicant: Yumiko Ohsaki , Seiji Takeuchi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A. Inc., I.P. Division
- Priority: JP2007-235947 20070911
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54

Abstract:
The present invention provides a measurement apparatus including a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and the optical system, a second polarization control unit which is inserted between the optical system and an image sensor, includes a phase plate, and is configured to control the polarization state of the light, and a processing unit configured to calculate the optical characteristics of the optical system, based on a plurality of interference patterns sequentially sensed by the image sensor by rotating the phase plate.
Public/Granted literature
- US20090066925A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD Public/Granted day:2009-03-12
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