Invention Grant
US07688424B2 Measurement apparatus, exposure apparatus, and device fabrication method 失效
测量装置,曝光装置和装置制造方法

Measurement apparatus, exposure apparatus, and device fabrication method
Abstract:
The present invention provides a measurement apparatus including a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and the optical system, a second polarization control unit which is inserted between the optical system and an image sensor, includes a phase plate, and is configured to control the polarization state of the light, and a processing unit configured to calculate the optical characteristics of the optical system, based on a plurality of interference patterns sequentially sensed by the image sensor by rotating the phase plate.
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