Invention Grant
- Patent Title: Projection optical system and method for photolithography and exposure apparatus and method using same
- Patent Title (中): 投影光学系统及光刻法及曝光装置及其使用方法
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Application No.: US11907801Application Date: 2007-10-17
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Publication No.: US07688517B2Publication Date: 2010-03-30
- Inventor: Yasuhiro Omura , Hironori Ikezawa
- Applicant: Yasuhiro Omura , Hironori Ikezawa
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2002-242925 20020823; GB0311470.9 20030519
- Main IPC: G02B3/00
- IPC: G02B3/00 ; G02B1/06 ; G02B17/00
Abstract:
An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.
Public/Granted literature
- US20080049306A1 Projection optical system and method for photolithography and exposure apparatus and method using same Public/Granted day:2008-02-28
Information query
