Invention Grant
- Patent Title: Gas radiation oven range
- Patent Title (中): 燃气辐射炉范围
-
Application No.: US10536395Application Date: 2002-11-29
-
Publication No.: US07690374B2Publication Date: 2010-04-06
- Inventor: Dae-Rae Lee , In-Gyu Kim , Dae-Hee Jung , Sug-Moon Choung , Yang Ho Kim
- Applicant: Dae-Rae Lee , In-Gyu Kim , Dae-Hee Jung , Sug-Moon Choung , Yang Ho Kim
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- International Application: PCT/KR02/02245 WO 20021129
- International Announcement: WO2004/051145 WO 20040617
- Main IPC: F24C3/00
- IPC: F24C3/00

Abstract:
A gas radiation oven range including an outer case (10) which is formed with an upper side opened, having an internal space, a ceramic glass (20) which is covered and combined with an upper end of the outer case (10), a plurality of burner housings (300) which are combined to be contacted with a lower surface of the ceramic glass (20), forms an exhaust passage (F) with the lower surface of the ceramic glass (20), and is integrally combined with a plurality of ports with different sizes, a radiant burner (40) which is combined with a side surface of the respective burner housings (300), for generating a radiant wave, combusting mixed gas and a shared discharge unit which is positioned among the burner housings (300) and combined to be connected to respective exhaust passages (F) which are formed at a side portion of the burner housings (300).
Public/Granted literature
- US20060048767A1 Gas radiation oven range Public/Granted day:2006-03-09
Information query