Invention Grant
US07691277B2 Quartz component for plasma processing apparatus and restoring method thereof
有权
用于等离子体处理装置的石英组件及其恢复方法
- Patent Title: Quartz component for plasma processing apparatus and restoring method thereof
- Patent Title (中): 用于等离子体处理装置的石英组件及其恢复方法
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Application No.: US12071041Application Date: 2008-02-14
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Publication No.: US07691277B2Publication Date: 2010-04-06
- Inventor: Katsunori Suzuki , Kenji Nakamura
- Applicant: Katsunori Suzuki , Kenji Nakamura
- Applicant Address: JP Chiba
- Assignee: Kawasaki Microelectronics, Inc.
- Current Assignee: Kawasaki Microelectronics, Inc.
- Current Assignee Address: JP Chiba
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-055620 20030303
- Main IPC: H01L21/302
- IPC: H01L21/302 ; B24B1/00
Abstract:
The main surface of a quartz component is divided by an offset into a first region having a larger height around an inner perimeter and a second region adjacent to the outer perimeter of the first region. Repeated restoration of a damaged component by forming a bulge on the first region and machining the bulge to make a flat surface while maintaining the offset enables long term use of the component.
Public/Granted literature
- US20080206452A1 Quartz component for plasma processing apparatus and restoring method thereof Public/Granted day:2008-08-28
Information query
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