Invention Grant
- Patent Title: Apparatus for the removal of a fluorinated polymer from a substrate and methods therefor
- Patent Title (中): 用于从基材除去氟化聚合物的设备及其方法
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Application No.: US11237477Application Date: 2005-09-27
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Publication No.: US07691278B2Publication Date: 2010-04-06
- Inventor: Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
- Applicant: Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: IP Strategy Group, P.C.
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
An apparatus generating a plasma for removing fluorinated polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the fluorinated polymer.
Public/Granted literature
- US20070072433A1 Apparatus for the removal of a fluorinated polymer from a substrate and methods therefor Public/Granted day:2007-03-29
Information query
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