Invention Grant
US07691279B2 Method of producing a glass substrate for a mask blank and method of producing a mask blank 有权
用于掩模坯料的玻璃基板的制造方法和掩模坯料的制造方法

  • Patent Title: Method of producing a glass substrate for a mask blank and method of producing a mask blank
  • Patent Title (中): 用于掩模坯料的玻璃基板的制造方法和掩模坯料的制造方法
  • Application No.: US10809419
    Application Date: 2004-03-26
  • Publication No.: US07691279B2
    Publication Date: 2010-04-06
  • Inventor: Kesahiro Koike
  • Applicant: Kesahiro Koike
  • Applicant Address: JP Tokyo
  • Assignee: Hoya Corporation
  • Current Assignee: Hoya Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2003-087798 20030327
  • Main IPC: C03C15/00
  • IPC: C03C15/00 G03F9/00 B44C1/22
Method of producing a glass substrate for a mask blank and method of producing a mask blank
Abstract:
A method of producing a glass substrate for a mask blank has the steps of measuring a convex/concave profile of a surface of the glass substrate, controlling a flatness of the surface of the glass substrate to a value not greater than a predetermined reference value by specifying the degree of convexity of a convex portion present on the surface of the glass substrate with reference to a result of measurement obtained in the profile measuring step and executing local machining upon the convex portion under a machining condition depending upon the degree of convexity, and polishing, after the flatness control step, the surface of the glass substrate subjected to the local machining. The surface of the glass substrate subjected to the local machining is subjected to acid treatment after the flatness control step and before the polishing step.
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