Invention Grant
- Patent Title: Method for producing trichlorosilane
- Patent Title (中): 制备三氯硅烷的方法
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Application No.: US12190151Application Date: 2008-08-12
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Publication No.: US07691356B2Publication Date: 2010-04-06
- Inventor: Takaaki Shimizu , Kyoji Oguro
- Applicant: Takaaki Shimizu , Kyoji Oguro
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-229857 20070905
- Main IPC: C01B33/08
- IPC: C01B33/08 ; C07F7/00

Abstract:
A by-product mixture produced in a process for producing polycrystalline silicon is made to react with chlorine to form tetrachlorosilane (STC) distillate in a chlorination reaction vessel, and the tetrachlorosilane (STC) distillate is made to react with hydrogen in a hydrogenation reaction vessel to be converted into trichlorosilane (TCS). In the chlorination step, methyl chlorosilanes having boiling points close to TCS are hyper-chlorinated to be converted into hyper-chlorinated methyl chlorosilanes having higher boiling points, which facilitates the hyper-chlorinated methyl chlorosilanes to be separated into high concentration, and inhibits carbon from contaminating the polycrystalline silicon. A donor/acceptor eliminator is provided in the circulation cycle for producing TCS, and accordingly there is no need to take out a by-product produced in the process for producing TCS to the outside of the system, which can highly purify the TCS.
Public/Granted literature
- US20090060817A1 METHOD FOR PRODUCING TRICHLOROSILANE Public/Granted day:2009-03-05
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