Invention Grant
- Patent Title: Electrodeposited copper foil with carrier foil
- Patent Title (中): 带有载体箔的电沉积铜箔
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Application No.: US10488275Application Date: 2003-06-27
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Publication No.: US07691487B2Publication Date: 2010-04-06
- Inventor: Seiji Nagatani
- Applicant: Seiji Nagatani
- Applicant Address: JP Tokyo
- Assignee: Mitsui Mining & Smelting Co., Ltd.
- Current Assignee: Mitsui Mining & Smelting Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2002-196128 20020704
- International Application: PCT/JP03/08193 WO 20030627
- International Announcement: WO2004/005588 WO 20040115
- Main IPC: B32B15/08
- IPC: B32B15/08 ; H05K1/09 ; H05K3/38 ; C25D1/20

Abstract:
The present invention provides electrodeposited copper foil with a carrier foil which permits the formation of finer-pitch circuits and also enables the multilayer process to be easily performed to meet the requirements for recent printed wiring boards. According to the invention, there is provided electrodeposited copper foil with a carrier foil in which an adhesive interface layer is formed on a surface of the carrier foil and an electrodeposited copper foil layer is formed on the adhesive interface layer, which is characterized in that the electrodeposited copper foil layer is provided with a passivated layer formed without performing roughening treatment as nodular treatment and that a nickel-zinc alloy consisting essentially of 50 to 99% nickel by weight and 50 to 1% zinc by weight is adopted as the passivated layer.
Public/Granted literature
- US20040241487A1 Electrodeposited copper foil with carrier foil Public/Granted day:2004-12-02
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