Invention Grant
US07691547B2 Reticle containing structures for sensing electric field exposure and a method for its use
有权
用于感测电场暴露的掩模版包含结构及其使用方法
- Patent Title: Reticle containing structures for sensing electric field exposure and a method for its use
- Patent Title (中): 用于感测电场暴露的掩模版包含结构及其使用方法
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Application No.: US11724715Application Date: 2007-03-16
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Publication No.: US07691547B2Publication Date: 2010-04-06
- Inventor: Gavin Charles Rider
- Applicant: Gavin Charles Rider
- Applicant Address: US CO Colorado Springs
- Assignee: Microtome Precision, Inc.
- Current Assignee: Microtome Precision, Inc.
- Current Assignee Address: US CO Colorado Springs
- Agency: Patton Boggs LLP
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03C5/00
Abstract:
A reticle includes an image area having one or more electrically conductive portions susceptible to damage by an electric field and an electric field sensor feature, the sensor feature adapted to be at least as susceptible to being altered by the electric field as the electrically conductive portions of the image area, the sensor feature being located in a position which is more readily viewable to show alteration than the electrically conductive portions of the image area.
Public/Granted literature
- US20070218667A1 Reticle containing structures for sensing electric field exposure and a method for its use Public/Granted day:2007-09-20
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