Invention Grant
- Patent Title: Antireflective compositions for photoresists
- Patent Title (中): 用于光致抗蚀剂的抗反射组合物
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Application No.: US11159002Application Date: 2005-06-22
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Publication No.: US07691556B2Publication Date: 2010-04-06
- Inventor: Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Aritaka Hishida , Jianhui Shan , Hong Zhuang
- Applicant: Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Aritaka Hishida , Jianhui Shan , Hong Zhuang
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Sangya Jain
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
Public/Granted literature
- US20060058468A1 Antireflective compositions for photoresists Public/Granted day:2006-03-16
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