Invention Grant
- Patent Title: Resist composition and pattern forming method using the same
- Patent Title (中): 抗蚀剂组合物和图案形成方法使用其
-
Application No.: US11727002Application Date: 2007-03-23
-
Publication No.: US07691560B2Publication Date: 2010-04-06
- Inventor: Kazuyoshi Mizutami , Shinichi Sugiyama
- Applicant: Kazuyoshi Mizutami , Shinichi Sugiyama
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-081108 20060323; JP2006-218462 20060810; JP2007-033845 20070214
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.
Public/Granted literature
- US20070224539A1 Resist composition and pattern forming method using the same Public/Granted day:2007-09-27
Information query
