Invention Grant
- Patent Title: Method for manufacturing active matrix substrate, active matrix substrate, electro-optical device and electronic apparatus
- Patent Title (中): 有源矩阵基板，有源矩阵基板，电光器件和电子设备的制造方法
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Application No.: US11347687Application Date: 2006-02-03
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Publication No.: US07691654B2Publication Date: 2010-04-06
- Inventor: Katsuyuki Moriya
- Applicant: Katsuyuki Moriya
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2005-028587 20050204
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
A method for manufacturing an active matrix substrate having a pixel electrode including: forming a bank partitioning the pixel electrode by a droplet discharge method; and disposing a functional liquid containing a conductive material to a region partitioned by the bank so as to form the pixel electrode.
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