Invention Grant
- Patent Title: Radiation-emitting semiconductor element and method for producing the same
- Patent Title (中): 辐射发射半导体元件及其制造方法
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Application No.: US11067349Application Date: 2005-02-25
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Publication No.: US07691659B2Publication Date: 2010-04-06
- Inventor: Stefan Bader , Berthold Hahn , Volker Härle , Hans-Jürgen Lugauer , Manfred Mundbrod-Vangerow , Dominik Eisert
- Applicant: Stefan Bader , Berthold Hahn , Volker Härle , Hans-Jürgen Lugauer , Manfred Mundbrod-Vangerow , Dominik Eisert
- Applicant Address: DE Munich
- Assignee: Osram GmbH
- Current Assignee: Osram GmbH
- Current Assignee Address: DE Munich
- Agency: Fish & Richardson P.C.
- Priority: DE10020464 20000426; DE10026255 20000526; DE10051465 20001017
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
This invention describes a radiation-emitting semiconductor component based on GaN, whose semiconductor body is made up of a stack of different GaN semiconductor layers (1). The semiconductor body has a first principal surface (3) and a second principal surface (4), with the radiation produced being emitted through the first principal surface (3) and with a reflector (6) being produced on the second principal surface (4).The invention also describes a production method for a semiconductor component pursuant to the invention. An interlayer (9) is first applied to a substrate (8), and a plurality of GaN layers (1) that constitute the semiconductor body of the component are then applied to this. The substrate (8) and the interlayer (9) are then detached and a reflector (6) is produced on a principal surface of the semiconductor body.
Public/Granted literature
- US20050282373A1 Radiation-emitting semiconductor element and method for producing the same Public/Granted day:2005-12-22
Information query
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